RF-Magnetron Sputtering¹ýÀ¸·Î TiN.ZrN ¹× HA¸¦ ÄÚÆÃÇÑ TiÇÕ±ÝÀÇ Àü±âÈÇÐÀû Ư¼º(¥±)-ÄÚÆÃÈÄ ÇÕ±ÝÀÇ Àü±âÈÇÐÀû Ư¼ºÀ» Áß½ÉÀ¸·Î-
Electrochemical Characteristiecs of Cp-Ti and Ti Alloys Coated witn TiN, ZrN, and HA Using RF-Magnetron Sputteirng Method(¥±)
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¹ÚÀçÁØ ( Park Jae-Jun ) - Á¶¼±´ëÇб³ Ä¡°ú´ëÇÐ Ä¡°úÀç·áÇб³½Ç ¹× Ä¡°ú±âÀÚÀç½ÃÇèÆò°¡¼¾ÅÍ
ÃÖÇÑö ( Choe Han-Cheol ) - Á¶¼±´ëÇб³ Ä¡°ú´ëÇÐ Ä¡°úÀç·áÇб³½Ç ¹× »ýüÀç·á³ª³ë°è¸éÈ°¼ºÈ¼¾ÅÍ
°í¿µ¹« ( Ko Yeong-Mu ) - Á¶¼±´ëÇб³ Ä¡°ú´ëÇÐ Ä¡°úÀç·áÇб³½Ç ¹× »ýüÀç·á³ª³ë°è¸éÈ°¼ºÈ¼¾ÅÍ
KMID : 0362220070340040361
Abstract
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Ti-alloy;TiN;ZrN and HA film coating;potentiodynamic polarization; AC impedance
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